Evolution of the local environment around Er upon thermal annealing in Er and O co-implanted Si
作者:
A. Terrasi,
G. Franzo`,
S. Coffa,
F. Priolo,
F. D’Acapito,
S. Mobilio,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 70,
issue 13
页码: 1712-1714
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.118678
出版商: AIP
数据来源: AIP
摘要:
We present extended x-ray absorption fine structure (EXAFS) analyses of the ErLIIIedge in Er-doped (100) Si samples. The samples were prepared by multiple implants of Er and O resulting in the incorporation of1×1019Er/cm3and1×1020O/cm3in a 2.3-&mgr;m-thick amorphous layer. It has been found that the local environment around the Er sites, which consists of six Si first neighbors in the amorphous layer, evolves towards a mixed coordination with O and Si atoms after epitaxial regrowth of the layer at620 °C for 3 h. A further thermal treatment at900 °C removes the residual Er–Si coordination and produces a full oxygen coordinated first shell with an average of 5 O neighbors. The effects of the different thermal processes on the high resolution spectra of the 1.54&mgr;m Er photoluminescence were also measured and related to the EXAFS results. ©1997 American Institute of Physics.
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