Reduced lateral carrier diffusion for improved miniature semiconductor lasers
作者:
T. A. Strand,
B. J. Thibeault,
L. A. Coldren,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 81,
issue 8
页码: 3377-3381
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.365032
出版商: AIP
数据来源: AIP
摘要:
The desire to fabricate very small semiconductor lasers requires that we address problems associated with surface recombination. We have proposed and demonstrated a segmented quantum well active region in which lateral diffusion is intentionally reduced. Such a structure should prevent the transfer of electrons and holes from the interior of a laser device to the edges. The supply of carriers to surface-related carrier traps can thus be eliminated, and we need not concern ourselves with the electrical quality of the surfaces. In this work we present calculations which predict laser performance for various lateral diffusion conditions. ©1997 American Institute of Physics.
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