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Reduced lateral carrier diffusion for improved miniature semiconductor lasers

 

作者: T. A. Strand,   B. J. Thibeault,   L. A. Coldren,  

 

期刊: Journal of Applied Physics  (AIP Available online 1997)
卷期: Volume 81, issue 8  

页码: 3377-3381

 

ISSN:0021-8979

 

年代: 1997

 

DOI:10.1063/1.365032

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The desire to fabricate very small semiconductor lasers requires that we address problems associated with surface recombination. We have proposed and demonstrated a segmented quantum well active region in which lateral diffusion is intentionally reduced. Such a structure should prevent the transfer of electrons and holes from the interior of a laser device to the edges. The supply of carriers to surface-related carrier traps can thus be eliminated, and we need not concern ourselves with the electrical quality of the surfaces. In this work we present calculations which predict laser performance for various lateral diffusion conditions. ©1997 American Institute of Physics.

 

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