A scanning tunneling microscope adapted to a 3‐in. molecular‐beam‐epitaxy system
作者:
Roland Stalder,
Hans‐Ju¨rg Gu¨beli,
Hans von Ka¨nel,
Peter Wachter,
期刊:
Review of Scientific Instruments
(AIP Available online 1992)
卷期:
Volume 63,
issue 2
页码: 1676-1679
ISSN:0034-6748
年代: 1992
DOI:10.1063/1.1143322
出版商: AIP
数据来源: AIP
摘要:
The combination of a custom‐made scanning tunneling microscope with a commercial molecular‐beam‐epitaxy (MBE) system for 3‐in. wafers is reported. The design of the microscope allows the exchange of the tip and piezo scanning unit in ultrahigh vacuum, thus offering the possibility to apply various local probe techniques with the same instrument. The tip can be cleaned by baking and by Ar+‐ion sputtering. Good thermal stability and stiffness of the microscope is obtained by a lever‐type design using two similar parallel piezo tubes for the scanner and for a mechanical contact close to the tip, respectively. A two‐stage spring vibration isolation with internal viscous damping is used to achieve good mechanical stability for atomic‐scale resolution without any further vibration isolation of the MBE system.
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