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Transport properties of two‐dimensional electron gas systems in delta‐doped Si:In0.53Ga0.47As grown by organometallic chemical vapor deposition

 

作者: W‐P. Hong,   F. DeRosa,   R. Bhat,   S. J. Allen,   J. R. Hayes,  

 

期刊: Applied Physics Letters  (AIP Available online 1989)
卷期: Volume 54, issue 5  

页码: 457-459

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.100951

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have investigated the transport properties of a two‐dimensional electron gas formed in delta‐doped In0.53Ga0.47As grown by metalorganic chemical vapor deposition technique. Very high free‐electron concentrations of 1.4×1013and 9.6×1012cm−2have been obtained at 300 and 77 K, respectively. Hall mobilities of 9300 and 14 600 cm2/V s were measured with carrier concentrations of 3.7×1012and 3.0×1012cm−2at 300 and 77 K, respectively. This is a factor of 3 higher than is expected for homogeneously doped materials having a similar doping. Schubnikov–de Haas oscillations confirmed the two‐dimensional nature of the electronic structure in these delta‐doped materials, and electron effective masses were determined from cyclotron resonance measurements.

 

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