Transport properties of two‐dimensional electron gas systems in delta‐doped Si:In0.53Ga0.47As grown by organometallic chemical vapor deposition
作者:
W‐P. Hong,
F. DeRosa,
R. Bhat,
S. J. Allen,
J. R. Hayes,
期刊:
Applied Physics Letters
(AIP Available online 1989)
卷期:
Volume 54,
issue 5
页码: 457-459
ISSN:0003-6951
年代: 1989
DOI:10.1063/1.100951
出版商: AIP
数据来源: AIP
摘要:
We have investigated the transport properties of a two‐dimensional electron gas formed in delta‐doped In0.53Ga0.47As grown by metalorganic chemical vapor deposition technique. Very high free‐electron concentrations of 1.4×1013and 9.6×1012cm−2have been obtained at 300 and 77 K, respectively. Hall mobilities of 9300 and 14 600 cm2/V s were measured with carrier concentrations of 3.7×1012and 3.0×1012cm−2at 300 and 77 K, respectively. This is a factor of 3 higher than is expected for homogeneously doped materials having a similar doping. Schubnikov–de Haas oscillations confirmed the two‐dimensional nature of the electronic structure in these delta‐doped materials, and electron effective masses were determined from cyclotron resonance measurements.
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