Oxygen content control for as‐deposited YBa2Cu3Oxthin films by oxygen pressure during rapid cooling following laser deposition
作者:
M. Ohkubo,
T. Kachi,
T. Hioki,
J. Kawamoto,
期刊:
Applied Physics Letters
(AIP Available online 1989)
卷期:
Volume 55,
issue 9
页码: 899-901
ISSN:0003-6951
年代: 1989
DOI:10.1063/1.102449
出版商: AIP
数据来源: AIP
摘要:
As‐deposited epitaxial YBa2Cu3Oxthin films have been prepared by ArF excimer laser deposition followed by a rapid cooling with controlled oxygen pressure. The best film after the rapid cooling has aTcwith a zero resistance of 88 K and aJc(77 K) of 5.5×105A/cm2. It has been observed that thec‐lattice parameter decreases, that is, the oxygen contentxincreases from ∼6 to 7, with increasing oxygen pressure during the rapid cooling. The relation betweenxand oxygen pressure is almost consistent with that for a powder sample being in a thermal equilibrium. We conclude that the oxygen content in the as‐deposited films is determined by the thermal equilibrium oxygen content during the cooling process.
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