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Synthesis of GaN by N ion implantation in GaAs (001)

 

作者: X. W. Lin,   M. Behar,   R. Maltez,   W. Swider,   Z. Liliental‐Weber,   J. Washburn,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 18  

页码: 2699-2701

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.114297

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Both the hexagonal and cubic GaN phases were synthesized in GaAs (001) by 50 keV N ion implantation at 380 °C and subsequent furnace annealing at 850–950 °C for 10 min–2 h. For a fluence of 1.5×1017cm−2, transmission electron microscopy revealed that cubic GaN epitaxially crystallizes as precipitates in the GaAs matrix. A cubic‐to‐hexagonal GaN phase transition was observed for extended thermal anneals. By increasing the N fluence to 3×1017cm−2, a continuous buried layer of randomly oriented hexagonal‐GaN nanocrystals was produced. ©1995 American Institute of Physics.

 

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