Synthesis of GaN by N ion implantation in GaAs (001)
作者:
X. W. Lin,
M. Behar,
R. Maltez,
W. Swider,
Z. Liliental‐Weber,
J. Washburn,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 18
页码: 2699-2701
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114297
出版商: AIP
数据来源: AIP
摘要:
Both the hexagonal and cubic GaN phases were synthesized in GaAs (001) by 50 keV N ion implantation at 380 °C and subsequent furnace annealing at 850–950 °C for 10 min–2 h. For a fluence of 1.5×1017cm−2, transmission electron microscopy revealed that cubic GaN epitaxially crystallizes as precipitates in the GaAs matrix. A cubic‐to‐hexagonal GaN phase transition was observed for extended thermal anneals. By increasing the N fluence to 3×1017cm−2, a continuous buried layer of randomly oriented hexagonal‐GaN nanocrystals was produced. ©1995 American Institute of Physics.
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