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Measurement of interdiffusion in II–VI quantum‐well structures using optical methods

 

作者: I. Karla,   D. Shaw,   W. E. Hagston,   J. H. C. Hogg,   S. Chalk,   J. E. Nicholls,   C. Peili,  

 

期刊: Journal of Applied Physics  (AIP Available online 1996)
卷期: Volume 79, issue 4  

页码: 1895-1897

 

ISSN:0021-8979

 

年代: 1996

 

DOI:10.1063/1.361092

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The extent of interdiffusion in Cd1−xMnxTe/CdTe quantum‐well structures grown by molecular‐beam epitaxy was monitored by photoluminescence and photoluminescence excitation spectra. Thermal annealing of as‐grown and ion‐implanted structures in over pressures of cadmium (or tellurium) provide clear evidence that diffusion is controlled by cation vacancies and are consistent with a strong dependence of the interdiffusion coefficient on the vacancy concentration. ©1996 American Institute of Physics.

 

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