Measurement of interdiffusion in II–VI quantum‐well structures using optical methods
作者:
I. Karla,
D. Shaw,
W. E. Hagston,
J. H. C. Hogg,
S. Chalk,
J. E. Nicholls,
C. Peili,
期刊:
Journal of Applied Physics
(AIP Available online 1996)
卷期:
Volume 79,
issue 4
页码: 1895-1897
ISSN:0021-8979
年代: 1996
DOI:10.1063/1.361092
出版商: AIP
数据来源: AIP
摘要:
The extent of interdiffusion in Cd1−xMnxTe/CdTe quantum‐well structures grown by molecular‐beam epitaxy was monitored by photoluminescence and photoluminescence excitation spectra. Thermal annealing of as‐grown and ion‐implanted structures in over pressures of cadmium (or tellurium) provide clear evidence that diffusion is controlled by cation vacancies and are consistent with a strong dependence of the interdiffusion coefficient on the vacancy concentration. ©1996 American Institute of Physics.
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