首页   按字顺浏览 期刊浏览 卷期浏览 Micro-electroreflectance and photoreflectance characterization of the bias dependence o...
Micro-electroreflectance and photoreflectance characterization of the bias dependence of the quantum confined Stark effect in a fabricated 0.98 &mgr;m InGaAs/GaAs/InGaP laser

 

作者: Lionel Aigouy,   Fred H. Pollak,   Godfrey Gumbs,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 70, issue 19  

页码: 2562-2564

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.118919

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Using electro- and photoreflectance with a spatial resolution of≈10 &mgr;mwe have evaluated the energy of the fundamental conduction to heavy-hole (1C–1HH) quantum transition of a fabricated 0.98 &mgr;m InGaAs/GaAs/InGaPp-i-nquantum well laser structure as a function of bias and position on the laser stripe. From a comparison of the measured forward/reverse bias dependence of the1C–1HH energy with a theoretical calculation of the quantum confined Stark effect, we have been able to evaluate the built-in electric field and width of the insulating region. ©1997 American Institute of Physics.

 

点击下载:  PDF (109KB)



返 回