Observations on intensity oscillations in reflection high‐energy electron diffraction during chemical beam epitaxy
作者:
W. T. Tsang,
T. H. Chiu,
J. E. Cunningham,
A. Robertson,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 50,
issue 19
页码: 1376-1378
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.97861
出版商: AIP
数据来源: AIP
摘要:
We report the observation of reflection high‐energy diffraction (RHEED) intensity oscillations during the growth of GaAs using triethylgallium in chemical beam epitaxy (CBE). The oscillation period corresponds exactly to the time required for the growth of one monolayer. RHEED oscillation studies also suggest the absence of flux transients due to switching of gas flows, abrupt and complete initiation and termination of growth with submonolayer resolution, and that CBE is capable of thickness control with submonolayer precision when coupled with the use ofinsituRHEED intensity monitoring technique. The temperature and flux dependence of growth rates are also studied using RHEED oscillations. Results indicate that CBE growth is predominantly via a two‐dimensional layer‐by‐layer mechanism.
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