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Lead zirconate titanate ferroelectric capacitors produced on sapphire and gallium arsenide substrates

 

作者: R. Dat,   D.J. Lichtenwalner,   O. Auciello,   A.I. Kingon,  

 

期刊: Integrated Ferroelectrics  (Taylor Available online 1995)
卷期: Volume 8, issue 3-4  

页码: 309-316

 

ISSN:1058-4587

 

年代: 1995

 

DOI:10.1080/10584589508219665

 

出版商: Taylor & Francis Group

 

关键词: PLAD;PZT;ferroelectric;fatigue;imprint;GaAs

 

数据来源: Taylor

 

摘要:

Pb(ZrxTi1−x)O3(PZT) based ferroelectric capacitors have been produced at 600°C on R-cut sapphire and Si-doped (100) GaAs substrates using a pulsed laser ablation deposition (PLAD) technique. La0.5Sr0.5CoO3(LSCO) conducting electrodes deposited using PLAD serve as top and bottom electrodes. X-ray diffraction results show that the PZT film is polycrystalline and phase-pure in both cases. Electrical characterization of the films show remanant polarization in excess of 20 μC/cm2. Results of long term properties show that these capacitors: are very tolerant to extremely large numbers of switching cycles; retain charges over very long periods of time; and do not show a strong tendency for their dipoles to be imprinted in a preferred direction.

 

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