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Ion implanted metastable surface alloys in vanadium

 

作者: H.W. Alberts,   O. Meyer,   J. Geerk,  

 

期刊: Radiation Effects  (Taylor Available online 1983)
卷期: Volume 69, issue 1-2  

页码: 61-70

 

ISSN:0033-7579

 

年代: 1983

 

DOI:10.1080/00337578308221725

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

Vanadium single crystals have been low dose implanted with Ga-, Se-, Bi- and In-ions. Lattice positions have been determined with the channeling and backscattering technique. For Ga-, Bi-and In-atoms 100% substitutionality was observed. The Se-atoms were found to be slightly displaced from the substitutional lattice site. Furnace and pulsed electron beam annealing of the Se-implanted V-single crystals with energy densities insufficient for surface melting caused a further decrease of the substitutional fraction.

 

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