The PLZT (3/66/34), PLZT (3/46/54), PLZT (9/65/35) and PLZT (28/0/100) thin films were deposited on MgO (100), Sapphire (0001) and fused silica substrates by using pulsed KrF excimer laser deposition technique. The conventionalin-situand 2-step heating processes were utilized to facilitate the synthesis of a large area of uniform PLZT thin film. Pure perovskite phase can be obtained only under very narrow process conditions, the highly textured PLZT films can be easily obtained byin-situheating process. For PLZT (28/0/100) material, epitaxial films were successfully coated on MgO (100) substrates by 600°Cin-situand RTA 650°C 2-step heating processes. The latter was found to possess higher refractive index and lower extinction coefficient.