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Hydrogen dissociation on hot tantalum and tungsten filaments under diamond deposition conditions

 

作者: Toru Otsuka,   Manabu Ihara,   Hiroshi Komiyama,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 77, issue 2  

页码: 893-898

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.359015

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The electric power consumed by hot tantalum and tungsten filaments used to dissociate hydrogen molecules into hydrogen radicals was measured at filament temperatures of 2000, 2300, and 2500 °C and hydrogen pressures from 0.5–100 Torr. The measured power consumption at pressures above 30 Torr was well represented by a model that assumed thermodynamic equilibrium between H2and H near the filament. With decreasing pressure, however, the dissociation of H2shifted from an equilibrium‐controlled regime to a surface‐reaction‐rate controlled regime. The relationship between the power consumption and the pressure in the surface‐reaction‐rate controlled regime was correlated with the surface dissociation probability, which was determined to range from 0.18 to 0.94. ©1995 American Institute of Physics.

 

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