On the kinetics of solid phase regrowth and dopant activation during rapid thermal annealing of implantation amorphized silicon
作者:
W. O. Adekoya,
M. Hage‐Ali,
J. C. Muller,
P. Siffert,
期刊:
Journal of Applied Physics
(AIP Available online 1988)
卷期:
Volume 64,
issue 2
页码: 666-676
ISSN:0021-8979
年代: 1988
DOI:10.1063/1.341959
出版商: AIP
数据来源: AIP
摘要:
We have studied the solid phase epitaxial regrowth (SPER) of implantation [31P+,11B+(73Ge+preamorphized)] amorphized silicon in the temperature range 500–600 °C induced by rapid thermal annealing (RTA), using Rutherford backscattering (RBS) and channeling measurements. Our results show rate enhancements (&bartil;3.5–6.5) of the velocities of regrowth in all cases studied with respect to values reported in the literature for furnace‐induced epitaxy. The measured SPER activation energies (2.7 and 2.6 eV for31P+and11B+implantations, respectively) while being comparable to literature reported values, were nevertheless higher than the energy required for the activation of these dopants, &bartil;1.55–2.45 eV. Also, the ratioVB/VP(velocity of regrowth in the presence of boron with respect to phosphorus) gives a value of approximately 3 in both RTA and furnace‐induced kinetics. These results are explained by a model which takes into account the role of electrically active interfacial defect sites during SPER.
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