Morphology and crystallography of single crystal precipitates on Al alloy films grown by the sputtering method
作者:
Hideo Niwa,
Ichiro Yamaguchi,
Haruyoshi Yagi,
Masaharu Kato,
期刊:
Journal of Applied Physics
(AIP Available online 1993)
卷期:
Volume 73,
issue 12
页码: 8575-8579
ISSN:0021-8979
年代: 1993
DOI:10.1063/1.353387
出版商: AIP
数据来源: AIP
摘要:
When Al alloys such as Al‐1%Si or Al‐2%Cu are sputtered on Si substrates at elevated temperatures, extruded single crystal precipitates are observed on the alloy films. The morphology and crystallography of the precipitates are studied in detail using scanning electron microscopy and transmission electron microscopy. The precipitates on the Al‐2%Cu films contain a few percent Cu and are single crystals with crystallographically low‐index facet planes. The temperature profiles during and after the deposition for the favorable occurrence of the precipitation are also investigated.
点击下载:
PDF
(729KB)
返 回