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The photolysis of ethylene at 193 nm

 

作者: L. Giroux,   M. H. Back,   R. A. Back,  

 

期刊: Canadian Journal of Chemistry  (NRC Available online 1989)
卷期: Volume 67, issue 7  

页码: 1166-1173

 

ISSN:0008-4042

 

年代: 1989

 

DOI:10.1139/v89-176

 

出版商: NRC Research Press

 

数据来源: NRC

 

摘要:

The photolysis of ethylene has been studied at pressures from 50 to 3000 Torr using a pulsed ArF excimer laser at 193.3 nm. Major products were acetylene,n-butane, 1-butene, ethane, and 1,3-butadiene, with smaller amounts of propane, propene, methane, and allene. Quantum yields varied with pressure and reaction time; the latter dependence is ascribed to secondary photolysis of butene and butadiene. The reaction products are accounted for by three primary processes:followed by reactions of H,and C2H5radicals. The vibrationally excited C2H3radical can decompose to H + C2H2or can be stabilized by collision. The pressure dependence of the quantum yields of the primary processes [1]–[3] is complex, and a photodissociation mechanism involving several intermediates and excited states of ethylene is presented to account for the present results and previous measurements at 185 nm.Keywords:ethylene, uv photolysis.

 

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