首页   按字顺浏览 期刊浏览 卷期浏览 Electron spin resonance of pulsed plasma-enhanced chemical vapor deposited fluorocarbon...
Electron spin resonance of pulsed plasma-enhanced chemical vapor deposited fluorocarbon films

 

作者: Catherine B. Labelle,   Scott J. Limb,   Karen K. Gleason,  

 

期刊: Journal of Applied Physics  (AIP Available online 1997)
卷期: Volume 82, issue 4  

页码: 1784-1787

 

ISSN:0021-8979

 

年代: 1997

 

DOI:10.1063/1.365980

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Pulsed-rf excitation of hexafluoropropylene oxide has been used to deposit poly(tetrafluoroethylene)-like thin films. Films were deposited at pulse rates of10/20,10/50,10/200,and10/400 mson/ms off and analyzed using electron spin resonance spectroscopy (ESR). All four films produced similar broad ESR spectra, with an average width at maximum slope of∼60 Gand agvalue of 2.0045. The number of free electrons in a sample decreased with increasing pulse off time. This behavior can be modeled by the reaction of a free radical with a gas species, assuming that free radicals are generated only during the pulse on time. ©1997 American Institute of Physics.

 

点击下载:  PDF (90KB)



返 回