Electron spin resonance of pulsed plasma-enhanced chemical vapor deposited fluorocarbon films
作者:
Catherine B. Labelle,
Scott J. Limb,
Karen K. Gleason,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 82,
issue 4
页码: 1784-1787
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.365980
出版商: AIP
数据来源: AIP
摘要:
Pulsed-rf excitation of hexafluoropropylene oxide has been used to deposit poly(tetrafluoroethylene)-like thin films. Films were deposited at pulse rates of10/20,10/50,10/200,and10/400 mson/ms off and analyzed using electron spin resonance spectroscopy (ESR). All four films produced similar broad ESR spectra, with an average width at maximum slope of∼60 Gand agvalue of 2.0045. The number of free electrons in a sample decreased with increasing pulse off time. This behavior can be modeled by the reaction of a free radical with a gas species, assuming that free radicals are generated only during the pulse on time. ©1997 American Institute of Physics.
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