Electron trapping in &agr;‐alumina observed by electron‐induced x‐ray emission
作者:
P. Jonnard,
F. Vergand,
M. Kefi,
C. Bonnelle,
期刊:
Journal of Applied Physics
(AIP Available online 1996)
卷期:
Volume 79,
issue 6
页码: 2909-2912
ISSN:0021-8979
年代: 1996
DOI:10.1063/1.361221
出版商: AIP
数据来源: AIP
摘要:
Radiative recombination from states located in the band gap of single‐crystal &agr;‐alumina has been observed by electron‐induced x‐ray emission spectrometry. The variation of intensity as a function of the incident electron beam current has been determined. From this variation, we show that trapping of thermalized incident electrons takes place in the defect sites associated with the observed states. From the binding energies of the states, the sites have been identified as oxygen vacancies. ©1996 American Institute of Physics.
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