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Using reverse bias currents to differentiate between bulk degradation and interfacial degradation in hydrogenated amorphous siliconp‐i‐nstructures

 

作者: J. K. Arch,   S. J. Fonash,  

 

期刊: Journal of Applied Physics  (AIP Available online 1992)
卷期: Volume 72, issue 9  

页码: 4483-4485

 

ISSN:0021-8979

 

年代: 1992

 

DOI:10.1063/1.352337

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The ‘‘analysis of microelectronic and photonic structures’’ (amps) transport‐simulation computer program has been used to show that a distinction can be made between the effects of light‐induced bulk and interfacial degradation in hydrogenated amorphous silicon (a‐Si:H)p‐i‐ndetector and solar cell structures. Using reverse bias leakage (dark) currents,ampssimulations show that, forpandnlayers that do not allow significant injection of electrons and holes into the intrinsic layer of thep‐i‐nstructure, a light‐induced increase in the density of interfacial states will result in significantly different changes in the voltage behavior of the reverse bias dark currents than will a corresponding increase in the density of bulk defect states. This communication demonstrates that a careful study of the reverse bias dark currents can provide an excellent means of determining if light soaking ofa‐Si:Hp‐i‐ndevices results in bulk degradation, interfacial degradation, or both.

 

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