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Radiative and non‐radiative recombination in amorphous silicon

 

作者: D. Engemann,   R. Fischer,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1976)
卷期: Volume 31, issue 1  

页码: 37-43

 

ISSN:0094-243X

 

年代: 1976

 

DOI:10.1063/1.30783

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A model is presented for recombination in amorphous silicon, the essentials of which are: The fundamental electronic excitation with the lowest energy consists of a trapped electron bound to a trapped hole by Coulombic attraction. This concept is supported by the observation that an electric field in the range of 107Vm−1is able to quench photoluminescence, and by other luminescence and photoconductivity results.

 

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