Nitridation of silicon (111): Auger and LEED results
作者:
J. F. Delord,
A. G. Schrott,
S. C. Fain,
期刊:
Journal of Vacuum Science and Technology
(AIP Available online 1980)
卷期:
Volume 17,
issue 1
页码: 517-520
ISSN:0022-5355
年代: 1980
DOI:10.1116/1.570498
出版商: American Vacuum Society
关键词: SILICON;SURFACES;NITRIDATION;NITROGEN;IONS;ELECTRON DIFFRACTION;AUGER ELECTRON SPECTROSCOPY;SILICON NITRIDES;POLYCRYSTALS;FILMS;CHEMICAL BONDS;PYROMETERS;ARGON;SPUTTERING;ANNEALING;VERY HIGH TEMPERATURE;ULTRAHIGH VACUUM
数据来源: AIP
摘要:
Clean silicon (111) (7×7) surfaces at up to 1050°C have been reacted with nitrogen ions and neutrals produced by a low energy ion gun. The LEED patterns observed are similar to those previously reported for reaction of silicon (111) (7×7) with NH3. The nitrogenKLLpeak exhibits no shift or change in shape with nitride growth. At the same time the magnitude of the elemental siliconLVVpeak at 92 eV decreases progressively as a new peak at 84 eV increases. The position of both peaks appears to be independent of the degree of nitridation. Since the Auger spectra are free of oxygen and other impurities, these features can be attributed only to silicon, nitrogen, and their reaction products. Characteristic features of the Auger spectra are related to LEED observations and to the growth of microcrystals of Si3N4.
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