Growth and polarization features of highly (100) orientedPb(Zr0.53Ti0.47)O3films on Si with ultrathinSiO2buffer layer
作者:
Y. Lin,
B. R. Zhao,
H. B. Peng,
B. Xu,
H. Chen,
F. Wu,
H. J. Tao,
Z. X. Zhao,
J. S. Chen,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 73,
issue 19
页码: 2781-2783
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.122589
出版商: AIP
数据来源: AIP
摘要:
Highly (100) orientedPb(Zr0.53Ti0.47)O3(PZT) films were prepared on Si substrates with ultrathinSiO2buffer layer by pulsed laser deposition. Hysteresis measurements show that saturation polarization, remnant polarization and coercive field of the films reach26 &mgr;C/cm2,10 &mgr;C/cm2and 70 kV/cm, respectively. The thickness ofSiO2buffer layer is found to play a significant role on phase purity and orientation of PZT as well as the prevention of interdiffusion. It is also found that the grain size and the interdiffusion between PZT and Si are the key factors for the ferroelectric properties of the films, which are discussed together with the synthesis condition in detail. ©1998 American Institute of Physics.
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