Characterization ofSrBi2Ta2O9ferroelectric thin films deposited at low temperatures by plasma-enhanced metalorganic chemical vapor deposition
作者:
Nak-Jin Seong,
Soon-Gil Yoon,
Seaung-Suk Lee,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 1
页码: 81-83
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.119475
出版商: AIP
数据来源: AIP
摘要:
Ferroelectric bismuth-layerSrBi2Ta2O9(SBT)thin films were prepared onPt/Ti/SiO2/Sisubstrate by plasma-enhanced metalorganic chemical vapor deposition. The films were crystallized at temperatures between 500 and 600 °C. The dielectric constant and dissipation factor of SBT films were 320 and 0.04 at an applied frequency of 1 MHz, respectively. The remanent polarization(Pr)and the coercive field(Ec)obtained for a 200 nm thickSr0.9Bi2.3Ta2.0O9films deposited at 550 °C were15 &mgr;C/cm2and 50 kV/cm at an applied voltage of 3 V, respectively. The leakage current density was about5.0×10−8 A/cm2at 300 kV/cm. The films showed fatigue-free characteristics up to1.0×1011switching cycles under 6 V bipolar pulse. ©1997 American Institute of Physics.
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