Electrical characterization ofp‐type ZnSe:Li epilayers grown onp+‐GaAs by molecular‐beam epitaxy
作者:
T. Marshall,
D. A. Cammack,
期刊:
Journal of Applied Physics
(AIP Available online 1991)
卷期:
Volume 69,
issue 7
页码: 4149-4151
ISSN:0021-8979
年代: 1991
DOI:10.1063/1.348434
出版商: AIP
数据来源: AIP
摘要:
Small‐signal ac admittance data are presented, and shown to provide accurate and unambiguous evidence ofp‐type behavior in Li‐doped ZnSe epilayers grown onp+‐GaAs. The devices measured are two‐terminal vertical‐transport structures, with unequal‐area contacts in order to distinguish effects arising from the top metal Schottky barrier from those arising from the heterojunction. Qualitative features of the data alone are sufficient to determine the (positive) sign of the mobile carriers in the ZnSe. The data are analyzed using an equivalent‐circuit model shown to be reliable forn‐type ZnSe, from which the net doping and the ZnSe resistivity are extracted. Using these quantities, the ZnSe hole mobility is found to be about 28±4 cm2/V s. Schottky barrier and heterojunction barrier heights are also determined.
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