首页   按字顺浏览 期刊浏览 卷期浏览 Electrical characterization ofp‐type ZnSe:Li epilayers grown onp+‐GaAs by...
Electrical characterization ofp‐type ZnSe:Li epilayers grown onp+‐GaAs by molecular‐beam epitaxy

 

作者: T. Marshall,   D. A. Cammack,  

 

期刊: Journal of Applied Physics  (AIP Available online 1991)
卷期: Volume 69, issue 7  

页码: 4149-4151

 

ISSN:0021-8979

 

年代: 1991

 

DOI:10.1063/1.348434

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Small‐signal ac admittance data are presented, and shown to provide accurate and unambiguous evidence ofp‐type behavior in Li‐doped ZnSe epilayers grown onp+‐GaAs. The devices measured are two‐terminal vertical‐transport structures, with unequal‐area contacts in order to distinguish effects arising from the top metal Schottky barrier from those arising from the heterojunction. Qualitative features of the data alone are sufficient to determine the (positive) sign of the mobile carriers in the ZnSe. The data are analyzed using an equivalent‐circuit model shown to be reliable forn‐type ZnSe, from which the net doping and the ZnSe resistivity are extracted. Using these quantities, the ZnSe hole mobility is found to be about 28±4 cm2/V s. Schottky barrier and heterojunction barrier heights are also determined.

 

点击下载:  PDF (316KB)



返 回