Hemispherical resonator study for surface‐emitting InGaAsP/InP lasers
作者:
X. L. Jing,
J. C. Ho,
P. K. L. Yu,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 5
页码: 432-433
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102756
出版商: AIP
数据来源: AIP
摘要:
For making surface‐emitting lasers such as InGaAsP/InP double‐heterostructure lasers, it is important to select and study the resonator properly. The authors have compared the relative light output power of two different structures, the plane‐parallel and the hemispherical resonators. The InGaAsP/InP double‐heterostructure was grown by liquid phase epitaxy. The different resonators on the same wafer were fabricated using chemical etching, lithography, evaporation, and other integrated circuit process techniques. Output optical power of the devices with the hemispherical resonator is a factor of 2 larger than those with the plane‐parallel resonator. This is because the hemispherical resonator structure has a smaller diffraction loss than the plane‐parallel structure.
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