High‐conductance customized copper interconnections produced by laser seeding and selective electrodeposition
作者:
Arunava Gupta,
C. Julian Chen,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 25
页码: 2516-2518
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102875
出版商: AIP
数据来源: AIP
摘要:
We report a two‐step process for producing high‐conductance customized copper interconnections utilizing a localized electrodeposition process induced by Joule heat at a constriction. An initial metal interconnection is made by localized decomposition of an organometallic film using a focused laser beam. The conductance of such an initial interconnection can be low, but is enough to induce localized copper deposition by passing an ac current through the entire line in a copper‐containing electrolyte. The interconnections produced by this process are solid, continuous, and highly conducting.
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