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Effect of brightener concentration on the thermal distortion of gold plated x‐ray masks

 

作者: W. J. Dauksher,   D. J. Resnick,   P. A. Seese,   K. D. Cummings,   A. W. Yanof,   W. A. Johnson,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1994)
卷期: Volume 12, issue 6  

页码: 3990-3994

 

ISSN:1071-1023

 

年代: 1994

 

DOI:10.1116/1.587416

 

出版商: American Vacuum Society

 

关键词: MASKING;X RADIATION;ELECTROPLATING;GOLD;THALLIUM ADDITIONS;STRESS RELAXATION;PLASTIC DEFORMATION;Au:Tl

 

数据来源: AIP

 

摘要:

In‐plane distortion of a fiducial array was used as a metric to compare the relative responses to heat treatments of x‐ray masks doped with different brightener levels. Samples plated from gold‐sulfite baths containing 0, 2, and 75 ppm Tl all distorted by more than 50 nm after annealing at 100 °C. Quenching in liquid nitrogen fully relieved the stress of the undoped sample only. Room temperature stress relaxation behavior after storage of the gold samples for 2.5 years is detailed. Gold samples doped to any level with a thallium‐based brightener gradually relax, if initially stressed, and remain at a zero stress state. Behavior is explained in terms of room temperature grain growth and plastic deformation.

 

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