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Interface properties for GaAs/InGaAlP heterojunctions by the capacitance‐voltage profiling technique

 

作者: Miyoko O. Watanabe,   Yasuo Ohba,  

 

期刊: Applied Physics Letters  (AIP Available online 1987)
卷期: Volume 50, issue 14  

页码: 906-908

 

ISSN:0003-6951

 

年代: 1987

 

DOI:10.1063/1.98028

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The conduction‐band discontinuity &Dgr;Ecand interface charge density &sgr; have been studied for GaAs/In0.5(Ga1−xAlx)0.5P heterojunctions, prepared by metalorganic chemical vapor deposition. The dependences of &Dgr;Ecand &sgr; on Al compositionxwere investigated forxfrom 0 to 1. The In0.5Al0.5P/ In0.5Ga0.5P heterojunction was also examined. The results suggest that the valence‐band discontinuity &Dgr;Evfor GaAs/In0.5(Ga1−xAlx)0.5P is a linear function ofxand is larger than &Dgr;Ec, being in reasonable agreement with results on the InAlP/InGaP heterojunction. The &sgr; values for GaAs/InGaAlP were found to be one order of magnitude larger than those for GaAs/AlGaAs and InAlP/InGaP heterojunctions.

 

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