Interface properties for GaAs/InGaAlP heterojunctions by the capacitance‐voltage profiling technique
作者:
Miyoko O. Watanabe,
Yasuo Ohba,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 50,
issue 14
页码: 906-908
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.98028
出版商: AIP
数据来源: AIP
摘要:
The conduction‐band discontinuity &Dgr;Ecand interface charge density &sgr; have been studied for GaAs/In0.5(Ga1−xAlx)0.5P heterojunctions, prepared by metalorganic chemical vapor deposition. The dependences of &Dgr;Ecand &sgr; on Al compositionxwere investigated forxfrom 0 to 1. The In0.5Al0.5P/ In0.5Ga0.5P heterojunction was also examined. The results suggest that the valence‐band discontinuity &Dgr;Evfor GaAs/In0.5(Ga1−xAlx)0.5P is a linear function ofxand is larger than &Dgr;Ec, being in reasonable agreement with results on the InAlP/InGaP heterojunction. The &sgr; values for GaAs/InGaAlP were found to be one order of magnitude larger than those for GaAs/AlGaAs and InAlP/InGaP heterojunctions.
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