Direct determination of the band‐gap states in hydrogenated amorphous silicon using surface photovoltage spectroscopy
作者:
E. Fefer,
Y. Shapira,
I. Balberg,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 3
页码: 371-373
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114632
出版商: AIP
数据来源: AIP
摘要:
Surface photovoltage spectroscopy (SPS) is used to determine the position of the deep defect state levels in undoped hydrogenated amorphous silicon (a‐Si:H). The occupied and the empty levels, and their nature, are identified with a clear advantage over existing methods. The identification of the levels and the effect of light soaking on their concentration provides direct experimental confirmation of the main features predicted by thermal equilibrium models. The finding of other levels ina‐Si:H materials of larger disorder further supports the recently proposed potential fluctuations model. ©1995 American Institute of Physics.
点击下载:
PDF
(64KB)
返 回