A novel soft x‐ray source for submicron resolution lithography is described. Exploratory experiments with thex‐pinch dense plasma radiation source have been performed using a 500 kA, 40 ns pulsed power generator. About 33 J of magnesiumK‐shell radiation (1.3–1.5 keV) and 10 J of aluminumK‐shell radiation (1.6–1.7 keV) have been produced in a source approximately 0.5 mm or less in diameter during a single pulse. The yield increased rapidly with current, implying the possibility of exposing a resist at a distance of 40 cm using a<750 kA pulser in as few as ten pulses.