Surfactant‐mediated epitaxy of metastable SnGe alloys
作者:
P. F. Lyman,
M. J. Bedzyk,
期刊:
Applied Physics Letters
(AIP Available online 1996)
卷期:
Volume 69,
issue 7
页码: 978-980
ISSN:0003-6951
年代: 1996
DOI:10.1063/1.117101
出版商: AIP
数据来源: AIP
摘要:
An effective method for molecular beam epitaxial construction of metastable, pseudomorphic SnGe/Ge(001) heterostructures is presented. This method exploits a surfactant species, Bi, to alter Sn surface‐segregation kinetics. Using the x‐ray standing wave technique, we demonstrate not only that Bi segregates to the growth surface more strongly than Sn, but that it also dramatically suppresses the segregation mobility of Sn. The limited Sn diffusivity, which is believed to stem from the full coordination of subsurface Sn atoms, allows the epitaxy of well‐ordered, metastable SnGe heterostructures. ©1996 American Institute of Physics.
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