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Aluminum single-electron nonvolatile floating gate memory cell

 

作者: C. D. Chen,   Y. Nakamura,   J. S. Tsai,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 14  

页码: 2038-2040

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.119780

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have developed an aluminum single-electron transistor device which was modified to incorporate an additional floating node in between the gate and the electrometer. At high gate voltages, Fowler–Nordheim type emission occurred between the gate and the floating node where the charges were stored. The emission events were evidenced by the oscillatory electrometer current which allowed estimation of the number of storage electrons. We demonstrated experimentally the nonvolatile memory function of this device and the results were justified by numeric simulations. ©1997 American Institute of Physics.

 

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