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Refractive index of InGaAs/InAlAs multiquantum‐well layers grown by molecular‐beam epitaxy

 

作者: S. Nojima,   H. Asahi,  

 

期刊: Journal of Applied Physics  (AIP Available online 1988)
卷期: Volume 63, issue 2  

页码: 479-483

 

ISSN:0021-8979

 

年代: 1988

 

DOI:10.1063/1.340267

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Refractive indices of InGaAs/InAlAs multiquantum‐well layers grown by molecular‐beam epitaxy are determined by reflectance measurements as a function of photon energy and barrier width, i.e., average Al content. These results are well explained by the single‐oscillator model; oscillator energy (E0) and dispersion energy (Ed) values vary linearly with average Al content. These values are, however, found to differ from the values obtained by the linear approximation of the parameters for binary alloys. Discussion of this discrepancy is also presented.

 

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