A new x‐ray lithographic technique using no thin‐film pattern masks is presented. A pattern image is projected by utilizing the total reflection of the x ray from a pattern plate, in which a pattern picture is drawn on a thick and hard substrate. The projected image is geometrically demagnified by the sine of incident angle of the x ray. And we actually succeeded in obtaining the demagnified line and space patterns of 1.9‐&mgr;m width from the similar patterns of 210 &mgr;m by using copperK&agr;x ray.