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Schottky junctions on CuInSe2films

 

作者: I. Shih,   C. X. Qiu,   S. N. Qiu,   J. F. Huang,  

 

期刊: Journal of Applied Physics  (AIP Available online 1988)
卷期: Volume 63, issue 2  

页码: 439-441

 

ISSN:0021-8979

 

年代: 1988

 

DOI:10.1063/1.340260

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Schottky junctions have been fabricated by evaporating aluminum on electrodepositedp‐type polycrystalline CuInSe2thin films. The devices showed a rectification effect with an ideality factor of about 2 in the low‐forward‐voltage region. Results of carrier concentration obtained fromC‐Vmeasurements of the Schottky devices were found to be consistent with those for CdS/CuInSe2heterojunctions fabricated on the same substrates. The apparent diffusion potential and carrier concentration of the Al/CuInSe2Schottky junctions were both found to increase after a short heat treatment at 200 °C in air.

 

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