Schottky junctions on CuInSe2films
作者:
I. Shih,
C. X. Qiu,
S. N. Qiu,
J. F. Huang,
期刊:
Journal of Applied Physics
(AIP Available online 1988)
卷期:
Volume 63,
issue 2
页码: 439-441
ISSN:0021-8979
年代: 1988
DOI:10.1063/1.340260
出版商: AIP
数据来源: AIP
摘要:
Schottky junctions have been fabricated by evaporating aluminum on electrodepositedp‐type polycrystalline CuInSe2thin films. The devices showed a rectification effect with an ideality factor of about 2 in the low‐forward‐voltage region. Results of carrier concentration obtained fromC‐Vmeasurements of the Schottky devices were found to be consistent with those for CdS/CuInSe2heterojunctions fabricated on the same substrates. The apparent diffusion potential and carrier concentration of the Al/CuInSe2Schottky junctions were both found to increase after a short heat treatment at 200 °C in air.
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