Formation and microstructural analysis of co-sputtered thin films consisting of cobalt nanograins embedded in carbon
作者:
J.-J. Delaunay,
T. Hayashi,
M. Tomita,
S. Hirono,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 82,
issue 5
页码: 2200-2208
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.366026
出版商: AIP
数据来源: AIP
摘要:
Cobalt–carbon thin films were deposited with a carbon concentration ranging from 27 to 57 at.&percent; at different substrate temperatures. The morphology and phases of as-deposited films were investigated by transmission electron microscopy and x-ray diffraction. The effect of annealing on the microstructure is reported. Under particular conditions of substrate temperature, carbon concentration, and subsequent annealing, a granular morphology consisting of nanocrystalline cobalt grains embedded in graphitelike carbon was obtained. The cobalt grains were uniform in size. The particle size could be controlled in the range from 4 to 7 nm by varying the carbon concentration. The cobalt phase was found to depend on the carbon concentration and substrate temperature. The hexagonal close-packed cobalt phase was observed only via the formation of the metastable carbide&dgr;′-Co2Cand its subsequent decomposition upon annealing. Otherwise the cobalt phase has a heavily faulted close-packed structure or a random stacking structure. ©1997 American Institute of Physics.
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