X-ray diffraction and x-ray photoelectron spectroscopy study of partially strained SiGe layers produced via excimer laser processing
作者:
S. Martelli,
I. Vianey,
R. Larciprete,
E. Borsella,
J. Castro,
S. Chiussi,
B. Leo´n,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 82,
issue 1
页码: 147-154
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.365793
出版商: AIP
数据来源: AIP
摘要:
Structural properties of gradedSi(1−x)Gexlayers obtained on Si(100) by pulsed laser induced epitaxy were investigated by means of conventional powder x-ray diffraction and x-ray photoelectron spectroscopy. TheSi(1−x)Gexepitaxial layers were formed by pulsed KrF-laser driven rapid melting and crystallization of thin amorphous Ge layers deposited onto the Si(100). The experimental results showed that, by increasing the number of laser pulses, good quality and partially strained epitaxial layers could be attained. A Monte Carlo data evaluation algorithm is proposed, which is capable to determine, by the simultaneous fit of data obtained by x-ray diffraction and x-ray photoelectron spectroscopy, the strain level as a function of Ge concentration. ©1997 American Institute of Physics.
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