首页   按字顺浏览 期刊浏览 卷期浏览 Neutral higher silane molecules in silane plasmas
Neutral higher silane molecules in silane plasmas

 

作者: Atsushi Suzuki,  

 

期刊: Applied Physics Letters  (AIP Available online 1998)
卷期: Volume 73, issue 26  

页码: 3836-3838

 

ISSN:0003-6951

 

年代: 1998

 

DOI:10.1063/1.122897

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Neutral higher silane molecules in silane radio frequency glow discharge plasmas are investigated using photoionization mass spectroscopy at various radio frequency (rf) powers and total pressures. Densities of higher silane molecules increase with rf power up to 10 W, and then decrease at 10–100 W. The reduction of the neutral higher silane molecules at high rf power suggests that these molecules contribute to the particle formation through secondary reactions in the plasma. ©1998 American Institute of Physics.

 

点击下载:  PDF (65KB)



返 回