Vacuum ultraviolet to visible emission of some pure gases and their mixtures used for plasma processing
作者:
A. C. Fozza,
A. Kruse,
A. Holländer,
A. Ricard,
M. R. Wertheimer,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1998)
卷期:
Volume 16,
issue 1
页码: 72-77
ISSN:0734-2101
年代: 1998
DOI:10.1116/1.581014
出版商: American Vacuum Society
数据来源: AIP
摘要:
The vacuum ultraviolet (VUV) to near infrared emissions(112⩽λ⩽880 nm)from molecular gases (H2andO2) and molecular gas–noble gas mixtures (H2–ArandO2–Ar) have been investigated with two separate spectrophotometric instruments. We report the influence of plasma parameters such as gas composition, pressure, and microwave power upon the plasma emission. In the case of mixtures with noble gases, we selected a range of plasma parameters so as to obtain very intense VUV emissions, which can be useful for the photochemical treatment of polymer surfaces. Some kinetics mechanisms involved are discussed.
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