A brief review is presented of the ‘‘Raduga’’ 1–4 repetitively pulsed metal vapor vacuum arc ion sources. Their operation principles and functional ranges are described. The Raduga ion sources provide single‐ and multi‐element implantation. These advantages are achieved by using not only pure single‐element or mixed ion fluxes, but also pulsed beam sequences with controllable composition and energy of each ion species. Another feature of the ion sources is their ability to generate a sequence of ion beam and plasma stream pulses. Switching between ion irradiation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. Some specific features of the emission properties of broad beam metal vapor vacuum arc ion sources are described.