Activation mechanism of zinc implants in GaAs
作者:
Rachid Bensalem,
Brian Sealy,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 50,
issue 19
页码: 1382-1383
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.97863
出版商: AIP
数据来源: AIP
摘要:
Rapid thermal annealing has been used to study the activation mechanism of zinc ions implanted into GaAs. The data divide into two parts, a time‐dependent and a time‐independent regime. Analysis of these regimes suggests that inactive zinc becomes electrically active by local diffusion to an unoccupied gallium vacancy, the energy for this process being 1.1 eV. The time‐independent regime produces another energy of 0.37 eV which is suggested to be the energy required to place a zinc atom onto a gallium vacancy.
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