Effect of argon ion implantation dose on silicon Schottky barrier characteristics
作者:
S. Ashok,
H. Kra¨utle,
H. Beneking,
期刊:
Applied Physics Letters
(AIP Available online 1984)
卷期:
Volume 45,
issue 4
页码: 431-433
ISSN:0003-6951
年代: 1984
DOI:10.1063/1.95247
出版商: AIP
数据来源: AIP
摘要:
The electrical characteristics of Schottky diodes fabricated on silicon surfaces subject to low‐energy (10 keV) argon ion implantation have been studied as a function of Ar+ion dose. Significant changes in electrical characteristics are seen for ion doses as low as 5×1011cm−2, well below the amorphization threshold dose for Si. In conjunction with the ion energy threshold established earlier for Si surface damage effects (∼25 eV), these results outline fundamental limits on the effect of ion‐assisted dry etching processes on Si surface barriers.
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