The mechanisms of impurity redistribution on laser-annealing of ion-implanted semiconductors
作者:
A.V. Dvurechensky,
G.A. Kachurin,
A.Kh. Antonenko,
期刊:
Radiation Effects
(Taylor Available online 1978)
卷期:
Volume 37,
issue 3-4
页码: 179-181
ISSN:0033-7579
年代: 1978
DOI:10.1080/00337577808233187
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
Ion-implanted impurity profiles were studied after laser annealing in different regimes. It was found that the redistribution of impurities in silicon occurs after annealing with both millisecond and nanosecond laser pulses. The character of redistribution depends on the power density of the light beam. In the case of relatively low power-density the most probable mechanism of impurity migration seems to be interstitial diffusion. For high power-densities the redistribution is caused by the flux of excess vacancies or by the recrystallization of the melted surface layer.
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