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Characterization of lateral semiconductor nanostructures by means of x-ray grazing-incidence diffraction

 

作者: K. Paschke,   T. Geue,   T. A. Barberka,   A. Bolm,   U. Pietsch,   M. Ro¨sch,   E. Batke,   F. Faller,   K. Kerkel,   J. Oshinowo,   A. Forchel,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 70, issue 8  

页码: 1031-1033

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.118473

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Free-standing wire arrays prepared by holographic exposure and wet chemical deep etching on a vertically arrangedGaAs/GaInAs/GaAs[001]single quantum well structure were characterized by x-ray grazing incidence diffraction using synchrotron radiation. Using a grazing angle of&agr;i≈0.05°the diffracted intensity stems primarily from the surface grating. It’s periodicity(D≈480 nm)was determined close to the(−220)and(220)Bragg reflection being parallel and perpendicular to the orientation of wires, respectively. The average wire width [(21.6±1.5) nmand(96.6±1.5) nm, respectively] and the coherence length of the grating(&xgr;≈2 &mgr;m)were obtained via Fourier transformation of the(220)shape function. ©1997 American Institute of Physics.

 

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