Characterization of lateral semiconductor nanostructures by means of x-ray grazing-incidence diffraction
作者:
K. Paschke,
T. Geue,
T. A. Barberka,
A. Bolm,
U. Pietsch,
M. Ro¨sch,
E. Batke,
F. Faller,
K. Kerkel,
J. Oshinowo,
A. Forchel,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 70,
issue 8
页码: 1031-1033
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.118473
出版商: AIP
数据来源: AIP
摘要:
Free-standing wire arrays prepared by holographic exposure and wet chemical deep etching on a vertically arrangedGaAs/GaInAs/GaAs[001]single quantum well structure were characterized by x-ray grazing incidence diffraction using synchrotron radiation. Using a grazing angle of&agr;i≈0.05°the diffracted intensity stems primarily from the surface grating. It’s periodicity(D≈480 nm)was determined close to the(−220)and(220)Bragg reflection being parallel and perpendicular to the orientation of wires, respectively. The average wire width [(21.6±1.5) nmand(96.6±1.5) nm, respectively] and the coherence length of the grating(&xgr;≈2 &mgr;m)were obtained via Fourier transformation of the(220)shape function. ©1997 American Institute of Physics.
点击下载:
PDF
(75KB)
返 回