Low resistance Pd/Zn/Pd ohmic contact top-In0.82Ga0.18As0.39P0.61
作者:
Moon-Ho Park,
L. C. Wang,
C. J. Palmstro&slash;m,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 81,
issue 6
页码: 2720-2724
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.363974
出版商: AIP
数据来源: AIP
摘要:
We report on the investigation of a low resistance Pd/Zn/Pd contact top-InGaAsP (&lgr;=1.14 &mgr;m). The contact had a minimum contact resistivity of ∼3×10−7&OHgr; cm2to the substrate doped to 2×1018cm−3. The samples showed rather uniform surface and interfacial morphologies. X-ray studies showed the formation of a PdZn phase for samples annealed below 400 °C and this phase started to decompose at temperatures higher than 400 °C. Pd-III compounds (Pd2Ga5and PdIn3) also started to form for annealing temperatures higher than 400 °C. The ohmic behavior can be understood in terms of the decomposition of the PdZn phase and the formation of Pd-III compounds for samples annealed at 400 °C or higher. The thermal stability of this contact at 400 °C was found to be stable, which is important for device applications. ©1997 American Institute of Physics.
点击下载:
PDF
(234KB)
返 回