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Epitaxial growth of InSb on sapphire by rf sputtering

 

作者: T. Miyazaki,   M. Mori,   S. Adachi,  

 

期刊: Applied Physics Letters  (AIP Available online 1991)
卷期: Volume 58, issue 2  

页码: 116-118

 

ISSN:0003-6951

 

年代: 1991

 

DOI:10.1063/1.104972

 

出版商: AIP

 

数据来源: AIP

 

摘要:

InSb films have been deposited directly by rf sputtering on sapphire substrates. X‐ray diffraction and scanning electron microscopy data are presented to show that the InSb layer on sapphire (0001) is epitaxial and grows with (111) parallel to the substrate surface. Optical absorption studies of the epitaxial film also reveal distinct spectral features which resemble these from bulk, single‐crystal InSb.

 

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