InP crystal growth on planar SiO2substrates
作者:
Satoshi Oku,
Hidefumi Mori,
Yoshiro Ohmachi,
期刊:
Journal of Applied Physics
(AIP Available online 1985)
卷期:
Volume 58,
issue 7
页码: 2767-2769
ISSN:0021-8979
年代: 1985
DOI:10.1063/1.335867
出版商: AIP
数据来源: AIP
摘要:
Orientation‐controlled InP microcrystals are grown on planar SiO2substrates by reacting molten In thin films with vaporized phosphorus in a closed system. Indium phosphide crystals having a (111) texture of about 7 &mgr;m in size, grow at the periphery of the In islands when the substrate is heated at 500 °C under a phosphorus vaporizing temperature of 330 °C. When the In thin films are triangularly patterned, the in‐plane 〈110〉 crystal direction is aligned parallel to the pattern edges by the capillary force effect between the In liquid and InP crystal.
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