Optimazation of thermal annealing process of lead lanthanum titanate ferroelectric thin films
作者:
Xiaoqing Wu,
Wei Ren,
Yinhua Mao,
Liangying Zhang,
Xi Yao,
期刊:
Integrated Ferroelectrics
(Taylor Available online 1999)
卷期:
Volume 23,
issue 1-4
页码: 15-23
ISSN:1058-4587
年代: 1999
DOI:10.1080/10584589908210137
出版商: Taylor & Francis Group
关键词: PLT thin films;dielectric and ferroelectric properties;I–Vcurve;C–Vcurve;pyroelectric currents;thermal annealing process
数据来源: Taylor
摘要:
Rapid thermal annealing (RTA), conventional furnace annealing (CFA) and combined RTA and CFA annealing (RCA) were adopted for thermal treatment of lead lanthanum titanate (PLT) thin films. Through comparison of morphologies, dielectric and ferroelectric properties, current-voltage (I–V) and capacitance-voltage (C–V) characteristics as well as pyroelectric currents, the features of each thermal annealing process were discussed. Optimized thermal annealing process was proposed. PLT thin films prepared by RCA process have higher remanent polarization, flatI–Vcurve, sharper nonlinearity peaks ofC–Vcurve and larger pyroelectric current density.
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