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Growth kinetics of planar binary diffusion couples: ’’Thin‐film case’’ versus ’’bulk cases’’

 

作者: U. Go¨sele,   K. N. Tu,  

 

期刊: Journal of Applied Physics  (AIP Available online 1982)
卷期: Volume 53, issue 4  

页码: 3252-3260

 

ISSN:0021-8979

 

年代: 1982

 

DOI:10.1063/1.331028

 

出版商: AIP

 

数据来源: AIP

 

摘要:

It is proposed that interfacial reaction barriers in binaryA/Bdiffusion couples lead to the absence of phases predicted by the equilibrium phase diagram, provided that the diffusion zones are sufficiently thin (thin‐filmcase). With increasing thickness of the diffusion zones the influence of interfacial reaction barriers decreases and the simultaneous existence of diffusion‐controlled growth of all equilibrium phases is expected (bulkcase). Selective growth of the first and second phases and the effect of impurities are discussed with the influence of interfacial reaction barriers and with references to the known cases of silicide formation.

 

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