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Aberration due to misalignment in electrostatic lens and deflection systems

 

作者: Kenji Kurihara,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1990)
卷期: Volume 8, issue 3  

页码: 452-455

 

ISSN:0734-211X

 

年代: 1990

 

DOI:10.1116/1.585043

 

出版商: American Vacuum Society

 

关键词: ABERRATIONS;ELECTROSTATIC LENSES;DESIGN;FABRICATION;DEFLECTION;ELECTRODES;VLSI;ION BEAMS

 

数据来源: AIP

 

摘要:

The aberration of electrostatic lens and deflection systems due to misalignment is analyzed for design of microfabrication systems. The potential for a lens and deflector having an electrode axis shift is approximated by introducing a shift function that expresses the electrode shift from the optical axis. On the basis of this approximation, mixed aberrations due to misalignment of lens and deflector electrodes can be analyzed, including the effect of a nonuniform electrode axis shift. Practical third order aberration coefficients are formulated in a compact form by eight integration functions, and are classified into 67 geometrical aberration coefficients and 4 chromatic aberration coefficients.

 

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